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Design and simulation of lithium niobate thin film ridge waveguide for integrated optics applications

Abstract

We propose a TFLN ridge waveguide with a Si<sub>3</sub>N<sub>4</sub> strip for photonic integrated circuits applications. The dispersion is found to be -0.1 ps/m/nm at 1550 nm which is 6 times higher than single-mode fiber dispersion.

Research topics

  • Photonic and Optical Devices
  • Photorefractive and Nonlinear Optics
  • Advanced Fiber Laser Technologies

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DOI: 10.1117/12.2692557

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