article · RSC Advances
This research evaluates the organic compound 3,4-dimethoxy phenyl thiosemicarbazone, known as DMPTS, as a corrosion inhibitor for copper exposed to acidic environments. Testing copper in a 1 M hydrochloric acid solution using weight loss measurements, potentiodynamic polarisation, and electrochemical impedance spectroscopy revealed that DMPTS notably enhances metal resistance. At an optimal concentration of 400 parts per million, the compound achieved an inhibition efficiency of up to 89 per cent. Detailed surface characterisation via scanning electron microscopy and atomic force microscopy confirmed that the inhibitor forms a physical barrier that alters surface morphology and reduces roughness. Infrared spectroscopy established that chemical adsorption drives this protective effect, with DMPTS molecules interacting directly with the copper substrate. Complementary quantum chemical computations and molecular analyses confirmed strong molecular bonding, providing fundamental insights into how thiosemicarbazone derivatives mitigate acid-induced metal degradation.
Acidic solutions rapidly degrade copper components used across industrial operations, leading to material failure and costly maintenance. By demonstrating that DMPTS acts through robust chemical adsorption to achieve high protection rates, this study clarifies how molecular barriers shield metals in harsh acid conditions. These findings help guide the molecular design of effective chemical inhibitors to prolong the operational lifespan of industrial copper assets.
The findings could inform the development of chemical additives to prevent copper corrosion during industrial operations involving acidic washes or hydrochloric acid handling. Potential users include chemical manufacturers, processing facilities, and corrosion management specialists. Because the research is based on laboratory-scale electrochemical testing and theoretical modelling, the technology is at an early stage of development and requires testing in operational industrial environments prior to practical deployment.
AI-generated from the published abstract. Always read the original work before citing.
This study investigates the corrosion inhibition potential of 3,4-dimethoxy phenyl thiosemicarbazone (DMPTS) for copper in 1 M hydrochloric acid (HCl) solutions, aiming to disclose the mechanism behind its protective action. Through an integrative methodology encompassing electrochemical analyses-such as weight loss measurements, potentiodynamic polarization, and electrochemical impedance spectroscopy (EIS)-we quantitatively evaluate the corrosion protection efficacy of DMPTS. It was determined that the optimal concentration of DMPTS markedly boosts the corrosion resistance of copper, achieving an impressive inhibition efficiency of up to 89% at 400 ppm. The formation of a protective layer on the copper surface, a critical aspect of DMPTS's inhibitory action, was characterized using Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM). These techniques provided empirical evidence of surface morphology modifications and roughness changes, affirming the formation of a protective barrier against corrosion. A significant advancement in our study was the application of Attenuated Total Reflectance Fourier Transform Infrared (ATR-FTIR) spectroscopy, which identified chemical adsorption as the definitive mechanism of corrosion inhibition by DMPTS. The ATR-FTIR results explicitly demonstrated the specific interactions between DMPTS molecules and the copper surface, indicative of a robust protective adsorbed layer formation. This mechanistic insight, crucial to understanding the inhibitory process, aligns with the protective efficacy observed in electrochemical and surface analyses. Theoretical support, provided by the Quantum Theory of Atoms in Molecules (QTAIM) and quantum chemical computations, further validated the strong molecular interaction between DMPTS and copper, corroborating the experimental findings. Collectively, this research not only confirms the superior corrosion inhibition performance of DMPTS in an acidic setting but also elucidates the chemical adsorption mechanism as the foundation of its action, offering valuable insights for the development of effective corrosion inhibitors in industrial applications.
This page summarises published work. The authoritative version sits with the publisher.
DOI: 10.1039/d3ra08629a
Is something wrong with this record? Report it or request removal.
Discussion
Have you built on this work, tried to replicate it, or seen it applied in practice? Share what you know. Verified researchers and MARATTO™ domain experts can open a discussion, and any member can reply. Contributions are reviewed before they appear.
No discussion yet. Open the first thread.
New to MARATTO™? Create a free account.
